文献类型：会议论文

英文题名：Reliability study of the band gap of rare earth oxides measured by XPS spectra

作者：Yang Xiaofeng[1,2];Tan Yongsheng[1];Fang Zebo[1];Wang Jianjun[1];Ni Henan[1,2];Li Zhibin[1];Chen Taihong[2]

机构：[1]Shaoxing Univ, Dept Phys, Shaoxing 312000, Zhejiang, Peoples R China;[2]China West Normal Univ, Coll Phys & Elect Informat, Nanchong 637002, Sichuan, Peoples R China

会议论文集：14th Annual Conference of the Chinese-Society-of-Micro-Nano-Technology, (CSMNT) / 3rd International Conference of the Chinese-Society-of-Micro-Nano-Technology

会议日期：NOV 04-07, 2012

会议地点：Hangzhou, PEOPLES R CHINA

语种：英文

外文关键词：high-k dielectrics; rare earth metal oxide; XPS; energy gap

外文摘要：Er2O3,Tm2O3 and Yb2O3 films were deposited on Si (100) and quartz substrates by radio frequency magnetron technique. The energy gaps of the films were measured by X-ray photoelectron spectroscopy (XPS) and optical methods. The energy gaps of Er2O3,Tm2O3 and Yb2O3 are found to be 6.3 +/- 0.1,5.8 +/- 0.1 and 7.1 +/- 0.1 eV by optical measurements. For XPS measurements, the energy gaps of the films are 6.2 +/- 0.2,6.0 +/- 0.2 and 6.9 +/- 0.2 eV, respectively. The results show that using XPS to measure the energy gap of rare earth metal oxide film is feasible in an allowable deviation.