详细信息
Experimental investigation on magnetorheological finishing properties for jade ( SCI-EXPANDED收录 EI收录)
文献类型:期刊文献
英文题名:Experimental investigation on magnetorheological finishing properties for jade
作者:Wu, Jinzhong[1];Gao, Pengfei[1];Luo, Liang[1];Wu, Fuzhong[1];Cong, Jinling[1];Zhang, Lihui[1];Zhang, Tianqi[1,2];Jiang, Weijiang[1];Yao, Weifeng[1]
机构:[1]Shaoxing Univ, Sch Mech & Elect Engn, Shaoxing 312000, Peoples R China;[2]Zhejiang Wanfeng Technol Dev Co Ltd, Shaoxing 312400, Peoples R China
年份:2025
卷号:622
外文期刊名:JOURNAL OF MAGNETISM AND MAGNETIC MATERIALS
收录:SCI-EXPANDED(收录号:WOS:001447882600001)、、EI(收录号:20251118048407)、Scopus(收录号:2-s2.0-86000640671)、WOS
基金:This work was supported by the National Natural Science Foundation of China (Grant Nos. 52405505) , the Natural Science Foundation of Zhejiang Province (CN) (Grant Nos. LZY23E050002, QN25E050025) , China Postdoctoral Science Foundation (grant No. 2024 M752897, 2023 M733174)
语种:英文
外文关键词:Jade finishing; Magnetorheological finishing; Process parameters; Surface roughness
外文摘要:Jade carries profound cultural significance and occupies an irreplaceable position in human society. This study proposes a magnetorheological finishing (MRF) process for jade to solve problems such as surface damage in traditional jade polishing. The original CNC jade engraving equipment was improved, and a jade MRF process experimental platform was established. Through comparative experiments between MRF process and traditional grinding wheel finishing, results were validated using a scanning electron microscope, confirming that MRF process could avoid surface damage and significantly improve polishing quality. The effects of abrasives and key process parameters, such as finishing gap, feed rate, and spindle speed, on surface quality and finishing efficiency were studied. For Hetian white jade (Ca2Mg5(Si4O11)2(OH)2), it was found that compared to diamond, CeO2, SiC, and ZrO2 abrasives, alumina abrasive yielded better finishing results. After 1 h of polishing, the surface roughness improved from Ra 615 nm to Ra 53.62 nm.
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