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Amorphous Er2O3 films for antireflection coatings     被引量:1

文献类型:期刊文献

中文题名:Amorphous Er_2O_3 films for antireflection coatings

英文题名:Amorphous Er2O3 films for antireflection coatings

作者:Zhu Yan-Yan[1];Fang Ze-Bo[2];Liu Yong-Sheng[1]

机构:[1]Shanghai Univ Elect Power, Shanghai 200090, Peoples R China;[2]Shaoxing Univ, Dept Phys, Shaoxing 312000, Peoples R China

年份:2010

卷号:19

期号:9

中文期刊名:中国物理B:英文版

外文期刊名:CHINESE PHYSICS B

收录:CSTPCD、、Scopus、CSCD2011_2012、CSCD

基金:Project supported by the Special Project of Shanghai Nano-technology (Grant No. 0852nm02400), the National Natural Science Foundation of China (Grant Nos. 10804072 and 60806031), and the Key Fundamental Project of Shanghai (Grant No. 08JC1410400).

语种:英文

中文关键词:Er2O3;抗反射涂层;薄膜;Si(001)衬底;射频磁控溅射技术;太阳能电池;非晶;工作波长

外文关键词:Er2O3 film; optical constants; insulators; solar power

中文摘要:This paper reports that stoichiometric, amorphous, and uniform Er2O3 films are deposited on Si(001) substrates by a radio frequency magnetron sputtering technique. Ellipsometry measurements show that the refractive index of the Er2O3 films is very close to that of a single layer antireflection coating for a solar cell with an air surrounding medium during its working wavelength. For the 90-nm-thick film, the reflectance has a minimum lower than 3% at the wavelength of 600 nm and the weighted average reflectances (400-1000 nm) is 11.6%. The obtained characteristics indicate that Er2O3 films could be a promising candidate for antireflection coatings in solar cells.

外文摘要:This paper reports that stoichiometric, amorphous, and uniform Er2O3 films are deposited on Si(001) substrates by a radio frequency magnetron sputtering technique. Ellipsometry measurements show that the refractive index of the Er2O3 films is very close to that of a single layer antireflection coating for a solar cell with an air surrounding medium during its working wavelength. For the 90-nm-thick film, the reflectance has a minimum lower than 3% at the wavelength of 600 nm and the weighted average reflectances (400-1000 nm) is 11.6%. The obtained characteristics indicate that Er2O3 films could be a promising candidate for antirefiection coatings in solar cells.

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